Work package 4
Validation for Metrology and industrialization

Task 1

Metrological validation of the SI standards

Task 2

Transfer of the quantum sensors to LNE

Task 3

Promotion of the measurement methods developed in FLATS to the  metrology community

Task 4

Integration with ”classical” electronics

Task 5

Towards mass production

Task 1
Led by LNE

Metrological validation of the SI standards

UCL will perform numerical simulations to reduce the spectrum of angles to explore in twisted devices. Home-made codes have been developed based on the Green’s function formalism in order to investigate the electronic and quantum transport properties of twisted bilayer graphene systems with a number of atoms up to the order of 105, thus being able to reach the size of experimental devices. We propose to rely on these numerical simulations to find efficiently the best range of angular alignment that will give rise to QAHE and superconductivity phenomena.
Task 2
Led by LNE

Transfer of the quantum sensors to LNE

CEA and LMU will transfer to LNE the measurements techniques concerning the single-electron and single-photon detectors, respectively, as a first step of making them adopted by the metrology community
Task 3
Led by LNE

Promotion of the measurement methods developed in FLATS to the  metrology community

With input from all partners, LNE will publish guidelines and good practice guides to validate the outputs of the twistronics paltform as new references for quantum metrology beyond the SI. Promotion in the international metrology community (CIPM, EURAMET, etc) will be done.
Task 4
Led by AMO

Integration with ”classical” electronics

With input from CEA and LNE, AMO will concept a prototype integrating a QAH device and a MZI with ”classical” electronics. This prototype aims to demonstrate on-chip combination of the quantum standards and sensors. AMO will moreover demonstrate a new way of integrating two- dimensional (2D) materials into semiconductor manufacturing lines that will be compatible with high- volume manufacturing on wafer level.
Task 5
Led by AMO

Towards mass production

Following T1.2, AMO, with input from UCL, will show that industrial scale fabrication of large area twisted hetero-structures with precise and homogeneous twist-angles is possible by CVD growth. This would be the basis to establish the twistronics platform.